E 1550
Horizontal furnace for pilot production
The centrotherm E 1550 horizontal furnace is optimized to support the multiple process capability needs of a small or medium volume production and features high process performance and flexibility. It contains up to 4 stacked quartz or SiC tube process chambers for wafer sizes up to 300 mm. The E 1550 perfectly combines operational and maintenance costs with a small footprint and thus allows the user cost-effective production possibilities.
- Atmospheric, PECVD and LPCVD processes
- Process selectable chamber options available in 3 or 4 stack configurations
- Advanced water cooling system guarantees no thermal interference between the different process tubes
- Optional: automated boat loading
- Modular component design for ease of installation and start up
Applications
- Annealing
- Diffusion
- LPCVD
- Oxidation
- PECVD
Note: centrotherm photovoltaics AG reserves the right to make changes in the product specifications at any time and without notice.
Datasheet Request
